In Proceedings of Proceedings CAD/Graphics 2001 - Seventh International Conference on Computer-Aided Design and Computer Graphics
Essential developments in feature modeling
Four essential developments in feature modelling are discussed that solve serious shortcomings in current feature modelling systems. First, in semantic feature modelling, it is possible to more adequately specify and maintain the meaning of features. Second, in enhanced multiple-view feature modelling, different views on a product are provided, also for conceptual and assembly design. Third, in collaborative feature modelling, several users can collaborate on the development of a product with full feature modelling functionality. Finally, in freeform feature modelling, features with freeform faces are made available. All developments are illustrated with results from research projects at Delft University of Technology, and also future developments are mentioned.
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@inproceedings{bib:bronsvoort:2001, author = { Bronsvoort, Willem F. and van den Berg, Eelco and Bidarra, Rafael and Noort, Alex }, title = { Essential developments in feature modeling }, booktitle = { In Proceedings of Proceedings CAD/Graphics 2001 - Seventh International Conference on Computer-Aided Design and Computer Graphics }, editors = { Peng, Q and Li W and Yu, J }, year = { 2001 }, pages = { 6--15 }, publisher = { International Academic Publishers - World Publishing Corporation, Beijing }, address = { Kunming, China }, url = { https://publications.graphics.tudelft.nl/papers/757 }, }